26 March 2015 Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning
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Abstract
LELECUT type triple patterning lithography is one of the most promising techniques in the next generation lithography. To prevent yield loss caused by overlay error, LELECUT mask assignment which is tolerant to overlay error is desired. In this paper, we propose a method that obtains an LELECUT assignment which is tolerant to overlay error. The proposed method uses positive semide_nite relaxation and randomized rounding technique. In our method, the cost function that takes the length of boundary of features determined by the cut mask into account is introduced.
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Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka, "Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning", Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 94270B (26 March 2015); doi: 10.1117/12.2085285; https://doi.org/10.1117/12.2085285
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