Plasma and Resist Interactions, including Patterning Quality Control for LER, CD Uniformity, etc.
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Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL
Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme
Finding practical phenomenological models that include both photoresist behavior and etch process effects
Low-temperature and damage-free transition metal and magnetic material etching using a new metallic complex reaction
Electron energy distribution control by fiat: breaking from the conventional flux ratio scaling rules in etch
RIE challenges for sub-15 nm line-and-space patterning using directed self-assembly lithography with coordinated line epitaxy (COOL) process
A facile route for fabricating graphene nanoribbon array transistors using graphoepitaxy of a symmetric block copolymer
Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr
Characterization of the effect of etch process operating environment on the perfluoroelastomer chamber seal systems