17 March 2015 Molecular glass resist performance for nano-pattern transfer
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Abstract
The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.
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Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, Jean-François de Marneffe, "Molecular glass resist performance for nano-pattern transfer", Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV, 94280J (17 March 2015); doi: 10.1117/12.2085828; https://doi.org/10.1117/12.2085828
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