17 March 2015 Molecular glass resist performance for nano-pattern transfer
Author Affiliations +
The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ziad el Otell, Ziad el Otell, Andreas Ringk, Andreas Ringk, Tristan Kolb, Tristan Kolb, Christian Neuber, Christian Neuber, Leander Hansel, Leander Hansel, Jean-François de Marneffe, Jean-François de Marneffe, "Molecular glass resist performance for nano-pattern transfer", Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV, 94280J (17 March 2015); doi: 10.1117/12.2085828; https://doi.org/10.1117/12.2085828

Back to Top