18 December 2014 Study of growth kinetics of amorphous carbon nanopillars formed by PECVD
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Proceedings Volume 9440, International Conference on Micro- and Nano-Electronics 2014; 94400D (2014) https://doi.org/10.1117/12.2179765
Event: The International Conference on Micro- and Nano-Electronics 2014, 2014, Zvenigorod, Russian Federation
Abstract
In this paper we study the process of plasma enhanced chemical vapor deposition (PECVD) of carbon nanostructures in the form of a film, the pillars, the flakes at a temperature of 100-350 °C from the vapor-gas mixture H2+CO+Ar. Also in the paper presents the structural features of the carbon nanopillars obtained at 250 °C. Determined mechanical stresses occurring during the growth of carbon nanostructures. Investigated the features of the growth of carbon pillars and proposed a phenomenological description of the process of their formation during PECVD process.
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D. Gromov, D. Gromov, N. Borgardt, N. Borgardt, Y. Grishina, Y. Grishina, A. Dedkova, A. Dedkova, E. Kirilenko, E. Kirilenko, S. Dubkov, S. Dubkov, } "Study of growth kinetics of amorphous carbon nanopillars formed by PECVD", Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400D (18 December 2014); doi: 10.1117/12.2179765; https://doi.org/10.1117/12.2179765
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