6 March 2015 Multiple-grating self-correcting algorithm for processed mark measurement error
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Proceedings Volume 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation; 94462M (2015) https://doi.org/10.1117/12.2181178
Event: International Symposium on Precision Engineering Measurement and Instrumentation, 2014, Changsha/Zhangjiajie, China
Abstract
When substrate is processed, also any measurement grating marks available on the substrate will be influenced: they will be deformed asymmetrically, which gives rise to a measurement-shift error when measuring such a grating mark. To measure on a processed mark, an algorithm is used. This algorithm describes a method to calculate the weight factor of the information from each order. The weight factors of such an algorithm are based on a model which describes the measurement position as a function of the diffraction orders and the mark position. This paper proposes an algorithm for finding these weight factors, and the feasibility of the method is validated through simulation.
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Tao Zhang, Tao Zhang, Jiubin Tan, Jiubin Tan, Jiwen Cui, Jiwen Cui, } "Multiple-grating self-correcting algorithm for processed mark measurement error", Proc. SPIE 9446, Ninth International Symposium on Precision Engineering Measurement and Instrumentation, 94462M (6 March 2015); doi: 10.1117/12.2181178; https://doi.org/10.1117/12.2181178
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