8 January 2015 Fabrication of ZnO nanostructures by PLD
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Proceedings Volume 9447, 18th International School on Quantum Electronics: Laser Physics and Applications; 94470H (2015) https://doi.org/10.1117/12.2175634
Event: Eighteenth International School on Quantum Electronics: Laser Physics and Applications, 2014, Sozopol, Bulgaria
Abstract
Different types of ZnO nanostructures were fabricated on metal (Au or Ag) coated silicon substrates by applying the pulsed laser deposition (PLD) method. The samples were prepared at substrate temperatures in the range of 300 – 650 °C, oxygen pressure of 5 Pa, and laser fluence ≤ 1 J.cm-2– process parameters usually used for thin-film deposition. The metal layer is essential for the preparation of nanostructures. The nanostructures grown at different substrate temperatures showed obvious morphological differences. The substrate temperature increase led to changes in the morphology of the nanostructures from nanowhiskers to nanowalls when a thin Au layer was used. It was also observed that the type and thickness of the metal layer affect the morphology of the nanostructure.
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A. Og. Dikovska, A. Og. Dikovska, G. B. Atanasova, G. B. Atanasova, G. V. Avdeev, G. V. Avdeev, M. E. Koleva, M. E. Koleva, N. N. Nedyalkov, N. N. Nedyalkov, } "Fabrication of ZnO nanostructures by PLD", Proc. SPIE 9447, 18th International School on Quantum Electronics: Laser Physics and Applications, 94470H (8 January 2015); doi: 10.1117/12.2175634; https://doi.org/10.1117/12.2175634
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