19 February 2015 Lithography process of micropore array pattern in Si microchannel plates
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Proceedings Volume 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014); 94493R (2015) https://doi.org/10.1117/12.2083180
Event: The International Conference on Photonics and Optical Engineering and the Annual West China Photonics Conference (icPOE 2014), 2014, Xi'an, China
Abstract
Microchannel plates(MCPs)are the key component of the image intensifier. Compared with the traditional MCPs, the Si MCPs which are fabricated by micro-nanofabrication technologies have a high gain, low noise and high resolution etc. In this paper, the lithography process is studied in the process of fabricating periodic micropore array with 10 um pores and 5 um pitch on Si. The effects of exposure time, reversal bake temperature and development time on the lithography quality are focused. By doing a series of experiments the better result is got: the photoresist film is obtained at a low speed 500/15(rpm/s) and a high speed 4500/50(rpm/s); the soft bake time is 10min at 100℃; the exposure time is 10s; the reversal bake time is 80s at 115℃; the development time is 55s. By microscope observation and measurement, the pattern is complete and the size of the pattern is accure, it meets the requirement of lithography process for fabricating Si-MCP.
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Linlin Fan, Jun Han, Huan Liu, Yawei Wang, "Lithography process of micropore array pattern in Si microchannel plates", Proc. SPIE 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014), 94493R (19 February 2015); doi: 10.1117/12.2083180; https://doi.org/10.1117/12.2083180
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