22 June 2015 Thermal stability of atomic layer deposition Al2O3 film on HgCdTe
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Abstract
Thermal stability of Atomic Layer Deposition Al2O3 film on HgCdTe was investigated by Al2O3 film post-deposition annealing treatment and Metal-Insulator-Semiconductor device low-temperature baking treatment. The effectiveness of Al2O3 film was evaluated by measuring the minority carrier lifetime and capacitance versus voltage characteristics. After annealing treatment, the minority carrier lifetime of the HgCdTe sample presented a slight decrease. Furthermore, the fixed charge density and the slow charge density decreased significantly in the annealed MIS device. After baking treatment, the fixed charge density and the slow charge density of the unannealed and annealed MIS devices decreased and increased, respectively.
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P. Zhang, C. H. Sun, Y. Zhang, X. Chen, K. He, Y. Y. Chen, Z. H. Ye, "Thermal stability of atomic layer deposition Al2O3 film on HgCdTe", Proc. SPIE 9451, Infrared Technology and Applications XLI, 94512A (22 June 2015); doi: 10.1117/12.2180414; https://doi.org/10.1117/12.2180414
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