Translator Disclaimer
Paper
22 May 2015 Angle resolved backscatter of HfO2/SiO2 multilayer mirror at 1064 nm
Author Affiliations +
Abstract
Angle resolved light scattering was measured at 1064 nm on an HfO2/SiO2 multilayer mirror deposited via modified plasma ion-assisted deposition. A total backscatter of approximately 4.0×10-4 was calculated by integrating the angle resolved scattering curves over the backscattering hemisphere. In this way, also the an integrated near angle backscatter of 1.2×10-4 was derived for angles from 0° to 2° and an integrated near angle scatter of 6×10-5 was determined in the most critical range from 0.5° to 2°. 12% of the total backscatter originated from the near angle region between 2° and 4°. 36%, 62%, 76% and 86% of the total backscatter were created from 2° to 10°, 20°, 30° and 40°, respectively. Good agreement was obtained for the total backscatter values calculated from the ARS measurements and the top-surface roughness derived by AFM measurements.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jue Wang, Sven Schröder, Marcus Trost, Matthias Hauptvogel, and Angela Duparré "Angle resolved backscatter of HfO2/SiO2 multilayer mirror at 1064 nm", Proc. SPIE 9453, Window and Dome Technologies and Materials XIV, 94530T (22 May 2015); https://doi.org/10.1117/12.2190663
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
Back to Top