Angle resolved backscatter of HfO2/SiO2 multilayer mirror at 1064 nm

Jue Wang; Sven Schröder; Marcus Trost; Matthias Hauptvogel; Angela Duparré

doi:10.1117/12.2190663

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22 May 2015 Angle resolved backscatter of HfO₂/SiO₂ multilayer mirror at 1064 nm

Jue Wang, Sven Schröder, Marcus Trost, Matthias Hauptvogel, Angela Duparré

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Proceedings Volume 9453, Window and Dome Technologies and Materials XIV; 94530T (2015) https://doi.org/10.1117/12.2190663
Event: SPIE Defense + Security, 2015, Baltimore, Maryland, United States

Abstract

Angle resolved light scattering was measured at 1064 nm on an HfO₂/SiO₂ multilayer mirror deposited via modified plasma ion-assisted deposition. A total backscatter of approximately 4.0×10^-4was calculated by integrating the angle resolved scattering curves over the backscattering hemisphere. In this way, also the an integrated near angle backscatter of 1.2×10^-4 was derived for angles from 0° to 2° and an integrated near angle scatter of 6×10^-5 was determined in the most critical range from 0.5° to 2°. 12% of the total backscatter originated from the near angle region between 2° and 4°. 36%, 62%, 76% and 86% of the total backscatter were created from 2° to 10°, 20°, 30° and 40°, respectively. Good agreement was obtained for the total backscatter values calculated from the ARS measurements and the top-surface roughness derived by AFM measurements.

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Jue Wang, Sven Schröder, Marcus Trost, Matthias Hauptvogel, and Angela Duparré "Angle resolved backscatter of HfO₂/SiO₂ multilayer mirror at 1064 nm", Proc. SPIE 9453, Window and Dome Technologies and Materials XIV, 94530T (22 May 2015); https://doi.org/10.1117/12.2190663

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