20 April 2015 Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing
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Abstract
The nonlinearity inherent in four-wave mixing in photorefractive (PR) materials is used for adaptive filtering. Examples include script enhancement on a periodic pattern, scratch and defect cluster enhancement, periodic pattern dislocation enhancement, etc. through intensity filtering image manipulation. Organic PR materials have large space-bandwidth product, which makes them useful in adaptive filtering techniques in quality control systems. For instance, in the case of edge enhancement, phase conjugation via four-wave mixing suppresses the low spatial frequencies of the Fourier spectrum of an aperiodic image and consequently leads to image edge enhancement. In this work, we model, numerically verify, and simulate the performance of a four wave mixing setup used for edge, defect and pattern detection in periodic amplitude and phase structures. The results show that this technique successfully detects the slightest defects clearly even with no enhancement. This technique should facilitate improvements in applications such as image display sharpness utilizing edge enhancement, production line defect inspection of fabrics, textiles, e-beam lithography masks, surface inspection, and materials characterization.
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Georges Nehmetallah, Georges Nehmetallah, Partha Banerjee, Partha Banerjee, Jed Khoury, Jed Khoury, } "Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing", Proc. SPIE 9477, Optical Pattern Recognition XXVI, 94770B (20 April 2015); doi: 10.1117/12.2176427; https://doi.org/10.1117/12.2176427
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