5 May 2015 Photonic structures in photoresist and PDMS surface patterned by AFM lithography
Author Affiliations +
This contribution demonstrates surface modification of thin photoresist layers and polydimethylsiloxane (PDMS) surfaces with spatial resolution better than 20 nm. We provided few different 2D arrangements of surface patterning with aim to prepare 2D photonic structures with various symmetries in the thin S1828 photoresist layer using AFM lithography. Consequently, we used the imprinting technique for transferring the photoresist pattern to the PDMS membrane surface. Finally, prepared 2D photonic structures in photoresist and PDMS surfaces are characterized by AFM.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Ďurišová, J. Ďurišová, S. Slabeyciusová, S. Slabeyciusová, D. Pudiš, D. Pudiš, D. Jandura, D. Jandura, "Photonic structures in photoresist and PDMS surface patterned by AFM lithography", Proc. SPIE 9502, Metamaterials X, 950211 (5 May 2015); doi: 10.1117/12.2181900; https://doi.org/10.1117/12.2181900

Back to Top