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12 May 2015 The universal method for optimization of undulator tapering in FEL amplifiers
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Abstract
Technique of undulator tapering in the post-saturation regime is used at the existing x-ray FELs for increasing the radiation power. There are also discussions on the future of high peak and average power FELs for scientific and industrial applications. Diffraction effects essentially influence on the choice of the tapering strategy. Recent studies resulted in an general law of the undulator tapering for a seeded FEL amplifier. In this paper we extend these results for the case of the Self Amplified Spontaneous Emission (SASE) FEL.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. A. Schneidmiller and M. V. Yurkov "The universal method for optimization of undulator tapering in FEL amplifiers", Proc. SPIE 9512, Advances in X-ray Free-Electron Lasers Instrumentation III, 951219 (12 May 2015); https://doi.org/10.1117/12.2181230
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