1 June 2015 ALD-tuned titanium dioxide nanophotonics
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Proceedings Volume 9519, Nanotechnology VII; 951903 (2015); doi: 10.1117/12.2178132
Event: SPIE Microtechnologies, 2015, Barcelona, Spain
Abstract
We demonstrate the possibilities of atomic layer deposition technology to fabricate and improve the quality of nanowaveguide devices of a different kind in TiO2 platform. In particular, we present an original re-coating method of improving the quality of amorphous TiO2 strip waveguides, which reduces the propagation losses significantly. Then we demonstrate how atomic layer deposition technology makes it possible to fabricate very precise slot waveguides and to tune the geometrical parameters of nanobeam cavities operating with visible light. The main fabrication methods of the presented structures are electron beam lithography, reactive ion etching and atomic layer deposition.
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Markus Häyrinen, Arijit Bera, Matthieu Roussey, Markku Kuittinen, Seppo Honkanen, "ALD-tuned titanium dioxide nanophotonics", Proc. SPIE 9519, Nanotechnology VII, 951903 (1 June 2015); doi: 10.1117/12.2178132; http://dx.doi.org/10.1117/12.2178132
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KEYWORDS
Waveguides

Atomic layer deposition

Titanium dioxide

Nanolithography

Resonators

Nanophotonics

Silicon

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