4 March 2015 Measurement and analysis on ion barrier film of MCP by ion beam sputtering deposition
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Proceedings Volume 9521, Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part I; 95211G (2015) https://doi.org/10.1117/12.2177787
Event: Selected Proceedings of the Photoelectronic Technology Committee Conferences held August-October 2014, 2014, China, China
Abstract
Ion barrier film (IBF) on the input side surface of Micro-channel Plate (MCP ) has a dual role in the high electron transmittance and high ionic blocking rate, and the quality of the film is very strict, so to choose a good coating way to meet the application of IBF-MCP in the third image intensifier is very important. Ion beam sputtering deposition (IBSD) technology is a relatively mature coating technology which can obtain a dense strong adhesion and smooth, high-quality film. This paper is carried out from the quality analysis on surface morphology, crystal structure and coating quality and comparison with qualified film to determine a better way to prepare IBF on the input side surface of MCP.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ni Zhang, Ni Zhang, Yu-Feng Zhu, Yu-Feng Zhu, Dan Li, Dan Li, Jing Nie, Jing Nie, Fan Zhang, Fan Zhang, Tai-min Zhang, Tai-min Zhang, Xiao-jian Liu, Xiao-jian Liu, Zhao-lu Liu, Zhao-lu Liu, Wei Cheng, Wei Cheng, Chang Chen, Chang Chen, } "Measurement and analysis on ion barrier film of MCP by ion beam sputtering deposition ", Proc. SPIE 9521, Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part I, 95211G (4 March 2015); doi: 10.1117/12.2177787; https://doi.org/10.1117/12.2177787
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