13 April 2015 Fabrication and surface profile simulation of sapphire microlens array
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Proceedings Volume 9522, Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part II; 95221Q (2015) https://doi.org/10.1117/12.2180221
Event: Selected Proceedings of the Photoelectronic Technology Committee Conferences held August-October 2014, 2014, China, China
Abstract
In this paper, photoresist reflow method was used to fabricate microlens array on the sapphire substrate which possesses high mechanical strength and transmittance in broad spectrum. High etch selectivity of sapphire over photoresist was obtained through adjusting ICP etching parameters. To test the fabrication process, a geometric model of square aperture microlens was built by finite element method. The validation of this model was done by comparing the surface profiles of three samples reflowed under different condition with the geometric model. In all three cases the simulation results were close to the experiment results. So the model was justified. On the other hand, the fabrication process was found to be repeatable because the surface profile of fabricated microlens was close to the theoretical surface profile of reflowed photoresist. The geometric model can be used to check the repeatability of photoresist reflow process and to predict the surface profile of microlens with irregular aperture.
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Xiangyang Liu, Xiangyang Liu, Shijia Liu, Shijia Liu, Hui Qiao, Hui Qiao, Longyuan Zhu, Longyuan Zhu, Xiangyang Li, Xiangyang Li, } "Fabrication and surface profile simulation of sapphire microlens array", Proc. SPIE 9522, Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part II, 95221Q (13 April 2015); doi: 10.1117/12.2180221; https://doi.org/10.1117/12.2180221
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