17 July 2015 Fabrication of two-dimensional micro patterns for adaptive optics by using laser interference lithography
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Proceedings Volume 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015); 952404 (2015) https://doi.org/10.1117/12.2184829
Event: International Conference on Optical and Photonic Engineering (icOPEN2015), 2015, Singapore, Singapore
Abstract
This paper presents a fabrication method of two-dimensional micro patterns for adaptive optics with a micrometric or sub-micrometric period to be used for fabrication of micro lens array or two-dimensional diffraction gratings. A multibeam two-axis Lloyd’s mirror interferometer is employed to carry out laser interference lithography for the fabrication of two-dimensional grating structures. In the proposed instrument, the optical setup consists of a light source providing a laser beam, a multi-beam generator, two plane mirrors to generate a two-dimensional XY interference pattern and a substrate on which the XY interference pattern is to be exposed. In this paper, pattern exposure tests are carried out by the developed optical configuration optimized by computer simulations. Some experimental results of the XY pattern fabrication will be reported.
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Xinghui Li, Xinghui Li, Yindi Cai, Yindi Cai, Ryo Aihara, Ryo Aihara, Yuki Shimizu, Yuki Shimizu, So Ito, So Ito, Wei Gao, Wei Gao, } "Fabrication of two-dimensional micro patterns for adaptive optics by using laser interference lithography", Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 952404 (17 July 2015); doi: 10.1117/12.2184829; https://doi.org/10.1117/12.2184829
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