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17 July 2015 EUV generation by plasmonic field enhancement using nanostructures
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Proceedings Volume 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015); 95241S (2015) https://doi.org/10.1117/12.2189570
Event: International Conference on Optical and Photonic Engineering (icOPEN2015), 2015, Singapore, Singapore
Abstract
Plasmonic field enhancement using metal nanostructures is investigated to boost the peak intensity of the incident femtosecond laser by a factor of greater than 20 dB while retaining the original ultrashort pulse dynamics. This method enables extreme ultraviolet (EUV) light generation directly from moderate femtosecond pulses of ~1 x 1011 W/cm2 intensities without auxiliary power amplification, demonstrating a possibility of achieving robust and reproducible EUV sources of the nano-scale for diverse EUV applications for microscopy, lithography and spectroscopy.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seunghwoi Han, Hyunwoong Kim, Young-Jin Kim, and Seung-Woo Kim "EUV generation by plasmonic field enhancement using nanostructures", Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95241S (17 July 2015); https://doi.org/10.1117/12.2189570
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