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17 July 2015 Extreme ultraviolet light sources and soft x-ray laser based on discharge produced plasma
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Proceedings Volume 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015); 95242U (2015) https://doi.org/10.1117/12.2195258
Event: International Conference on Optical and Photonic Engineering (icOPEN2015), 2015, Singapore, Singapore
Abstract
Due to the demand to realize shorter wavelength light sources, extreme ultraviolet (EUV) sources and soft x-ray laser (SXRL) are under development. The development of EUV sources at the wavelength of 13.5 nm started to realize light sources to be used for next generation lithography. Xenon was used at the beginning of development, however, to attain higher conversion efficiency, tin is now used as fuel. As a coherent light source, capillary discharge SXRL is under development. After the demonstration of Ne-like Ar SXRL by using electron collisional excitation scheme, the effort to shorten the wavelength has been made by adopting recombination scheme such as H-like N. Though the challenge has not yet been successful, the source has potential to be used as a SXR source in the water window wavelength region. Current status of EUV and SXR sources based on discharge produced plasma will be given.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eiki Hotta, Yusuke Sakai, Yasushi Hayashi, Gohta Niimi, Bin Huang, Qiushi Zhu, Inho Song, and Masato Watanabe "Extreme ultraviolet light sources and soft x-ray laser based on discharge produced plasma", Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95242U (17 July 2015); https://doi.org/10.1117/12.2195258
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