6 August 2015 Full-frequency sub-nanometer optics fabrication and testing
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Proceedings Volume 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015); 95244T (2015) https://doi.org/10.1117/12.2187648
Event: International Conference on Optical and Photonic Engineering (icOPEN2015), 2015, Singapore, Singapore
Abstract
Lithography projection objective is one of the most precise optical systems that people ever produced. The required accuracy of the optical elements including surface’s form, mid-frequency and high-frequency are down to nanometer and sub-nanometer, which is a great challenge for optical fabrication and testing. Based on the manufacturing of high NA optical lithography projection objective, the theories and technologies of sub-nanometer optics fabrication and testing are studied and developed. The typical and statistic results of high NA optical lithography objective elements are presented and an optical fabrication and testing line for lithography optics is established.
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Erlong Miao, Erlong Miao, Gaowen Wang, Gaowen Wang, Songtao Gao, Songtao Gao, Yongxin Sui, Yongxin Sui, Huaijiang Yang, Huaijiang Yang, } "Full-frequency sub-nanometer optics fabrication and testing", Proc. SPIE 9524, International Conference on Optical and Photonic Engineering (icOPEN 2015), 95244T (6 August 2015); doi: 10.1117/12.2187648; https://doi.org/10.1117/12.2187648
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