Abstract
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Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abe, Ryosuke, 0K

Abolhassani, Mohammad, 4F

Adams, Alvin, 20

Afrough, Mohsen, 14

Albert, Sven, 14

Albertazzi G. Jr., Armando, 0T, 0V

Allegre, Lisa, 1D

Amphawan, Angela, 2B

Anand, Arun, 3H, 3W

Ando, Shigeru, 18

Apedo, Komla L., 0Z

Arai, Y., 0W

Arasa, J., 2C

Arrue, Jon, 1Z

Artemenko, Yury, 40

Aschermann, Lars, 12

Asgari, Pegah, 47

Ayubi, Gastón A., 38

Azcona, Francisco, 1Y

Bai, Yunbo, 36

Bailly, Y., 3C, 3Y

Bardeau, J.-F., 08

Barsukov, Oleg A., 42

Baselt, Tobias, 0F, 0P, 3Z

Bechen, Benjamin, 1V

Belashov, A. V., 3V

Beloki, Josu, 1Z

Berger, U., 1T

Beyerer, Jürgen, 0Y

Biegen, James F., 0N

Bisht, Akanksha, 2B

Bisht, Ashish, 2B

Blobel, G., 1F

Bodenstorfer, Ernst, 1V

Borzoki, Hamid Razavi, 45

Bradu, Adrian, 09

Brandejs, Jan, 16

Braun, Jaroslav, 2O

Brockherde, Werner, 1V

Brodersen, Jörg, 1V

Casarin, R., 1O

Chang, Po-Yi, 28

Charrett, Thomas O. H., 1N, 20

Chen, Bo, 2V

Chen, Jinping, 11

Chen, Qian, 2E

Chhaniwal, Vani, 3H, 3W

Číp, Ondřej, 4K, 4L, 4M, 4N

Čížek, Martin, 4K, 4N

Cocola, L., 1O

Correns, Martin, 3J

Costil, Sophie, 3G

Curticapean, Dan, 4G

Czarske, J., 1U

Darudi, Ahmad, 47

Davin, T., 3C

de Groot, Peter J., 0N

Delorme, N., 08

Denisov, Victor M., 3Q, 4J

Desage, Simon-Frédéric, 23

Dietrich, Patrick, 15

Distante, Cosimo, 0L

Drabarek, Pawel, 0O

Dreiden, G. V., 3V

E, Kewei, 0X

Edely, M., 08

Eifler, Matthias, 10

Elster, C., 1F

Ermolaev, Petr A., 33

Ettemeyer, Andreas, 26

Falaggis, K., 03

Favrelière, Hugues, 23

Fedel, M., 1O

Feng, Shijie, 2E

Ferraro, Pietro, 0J, 0L

Ferrerira, Carlos, 3X

Feugeas, Françoise, 0Z

Filatov, Yuri V., 3O

Fischer, A., 1U

Fond, Christophe, 0Z

Fontana, Filipe, 0V

Forbes, G. W., 1B

Fortmeier, I., 1F

Fried, M., 1S

Fu, Hongyuan, 37

Fu, Xing, 11 Fu, Y., 21

Gao, Chunfeng, 2A

Gao, Hongwen, 30

Gao, Peng, 0I

García, Iker, 1Z

Garcia, Javier, 3U, 3X

Garcia-Sucerquia, J., 08

Gautier, F., 1X

Georges, Marc P., 1L

Gianto, Gianto, 0Z

Gladkovskiy, Sergey V., 25

Gollor, Pascal, 0Q

Gorbachev, Alexey A., 4C

Goto, Kazufumi, 0K

Granero, Luis, 3U, 3X

Greborio, L., 4O

Gronle, Marc, 22

Grübler, Till, 0O

Grzesiak, A., 1T

Gu, Yue, 11

Guo, Guangrao, 0X

Guo, M., 21

Guo, Tong, 11

Gusarov, Vadim F., 4B

Hæggström, Edward, 2F, 3L

Haist, Tobias, 22

Hao, Xiangyang, 3B

Hartmann, Peter, 0F, 0P, 3Z

Hayasaki, Yoshio, 04, 0K

He, Jianguo, 0B

He, Xin, 2K

Heinrich, A., 1T

Heist, Stefan, 15

Hering, Julian, 10

Hervé, P., 3C, 3Y

Hirschl, Ch., 0P

Hoang, Van Phong, 40

Hoffmann, Rolf, 3K

Holá, Miroslava, 4L, 4M

Horvath, Z., 1S

Hrabina, Jan, 4K, 4L, 4M, 4N

Hu, Guohang, 34

Hu, Xiaotang, 11

Huang, Y., 1U

Hucl, Václav, 4K, 4N

Ishikawa, Shinji, 04

Ivashchenko, E. M., 2G

Jain, Pranay, 4A

James, Stephen W., 20

Javadian Varjovi, Soheila, 3P

Javidi, Bahram, 0J, 3H, 3U

Jha, Ajit, 1Y

Ji, Fang, 0B

Jiang, Lixing, 3B

Jin, Chunshui, 1K

Jin, Chunxiang, 36

Joo, K.-N., 07

Juhasz, G., 1S

Kahl, Michael, 26

Kamantsev, Ivan S., 25

Kassamakov, Ivan, 2F, 3L

Kästner, Markus, 0R, 13

Katelevsky, Vadim Ya., 2N

Khani, Mohammad Reza, 45

Kim, B. K., 07

Kim, Myun-Sik, 1D

Kissinger, Thomas, 20

Kleshchenok, Maksim A., 1W, 3T

Koch, Alexander W., 1R

Koch, E., 0P

Konyakhin, Igor A., 1W, 2M, 2W, 40, 42, 43 Korotaev, Valery V., 2U, 32, 3Q, 3T, 4C, 4J

Kostencka, Julianna, 0M

Kozacki, Tomasz, 03, 0M

Ku, Yi-Sha, 28

Kühnhold, Peter, 0Q, 2F

Kühmstedt, Peter, 12, 15

Kujawińska, Malłgorzata, 1M

Kumar, Santosh, 2B

Kuptsov, Vladimir D., 2N

Kurihara, Toru, 18

Kuschmierz, R., 1U

Lages Martins, Luis F., 2D

Längle, Thomas, 0Y

Larichev, Roman A., 3O

Lasagni, Andrés-Fabián, 3Z

Lashmanov, Oleg U., 2U, 2W

Latyev, Svjatoslav M., 35

Lazar, Josef, 4K, 4L, 4M, 4N

Le Goïc, Gaëtan, 23

Lebedinsky, J., 3C, 3Y

Lebedko, Evgeni G., 3A, 3I

Lehmann, Peter, 0Q, 2F

Leick, Lasse, 09

Leo, Marco, 0L

Lešundák, Adam, 4K

Li, Dahai, 0X

Li, Mengyang, 0X

Li, Min, 0H

Li, Renpu, 40

Li, Yinan, 0R

Lindlein, N., 0U

Liu, H., 21

Liu, Qian, 0B

Liu, Shijie, 34, 36

Liu, Songlin, 3B

Liu, Yong, 2V

Liu, Yongjun, 37

Löffler, F., 1U

Long, Xingwu, 2A, 2K

Lutzke, Peter, 15

Ma, Dongmei, 1K

Ma, Hua, 2V

Ma, Kang, 1P

Madanipour, Khosro, 3P, 45

Mahajan, Swapnil, 3H, 3W

Maillard, P., 1T

Major, C., 1S

Malek, M., 08

Malesa, Marcin, 1M

Mantel, K., 0U

Maraev, Anton A., 4B

Maria, Michael, 09

Martínez-Carranza, J., 03

Matthias, Steffen, 13

Mayer, Konrad J., 1V

Mayershofer, D., 2C

Meguellati, S., 2L

Memmolo, Pasquale, 0J, 0L

Metschke, S., 1U

Micó, Vicente, 3U, 3X

Mikel, Břetislav, 4K, 4L, 4N

Mikheev, Sergey V., 42

Mikš, A., 2I

Minh, Tuan Pham, 4N

Minoshima, Kaoru, 02

Moalla, R., 08

Mocellin, M., 1O

Moiseeva, Anastasia A., 2M

Molev, Fedor V., 2W

Molsen, Henning, 06

Montgomery, Paul C., 0Z

Montonen, Risto, 3L

Mu, Tingkui, 2V

Munkelt, Christoph, 12

Murr, Patrik J., 1R

Nakajima, Yoshiaki, 02

Navello, L., 3C, 3Y

Nekrylov, Ivan S., 3M, 3N

Nelsen, Bryan, 0F

Nercissian, Vanusch, 0U

Netti, Paolo Antonio, 0J

Nie, Xiaoming, 2K

Nikulin, Anton V., 3M, 3N

Nitta, Christian, 1V

Noell, Wilfried, 1D

Nolvi, A., 2F

Notni, Gunther, 15, 3J, 3K

Novák, J., 2I

Novák, P., 2I

Offret, J.-P., 3C, 3Y

Olivero, M., 4O

Oreski, G., 0P

Orta, R., 4O

Ortega Clavero, Valentin, 4G

Osten, Wolfgang, 22

Österberg, Kenneth, 3L

Oulehla, Jindřich, 4M

Paloušek, David, 16

Pantyushin, Anton V., 4C

Paturzo, Melania, 0J, 0L

Pavlov, P. A., 2G

Pellegrino, P., 4O

Perrone, G., 4O

Petrik, P., 1S

Petrov, N. V., 3V

Pezerat, C., 1X

Pfeiffer, Pierre, 3G

Picart, P., 08, 1X

Picazo-Bueno, Jose Angel, 3X

Pillet, Maurice, 23

Pina, V., 3Y

Pitard, Gilles, 23

Podoleanu, Adrian Gh., 09

Poittevin, J., 1X

Pokorný, P., 2I

Poletto, L., 1O

Pourvais, Yousef, 47

Prajapati, Mahendra, 3H

Pravdová, Lenka, 4K

Preißler, Marc, 3K

Provaznik, Milan, 4M

Rebordão, José Manuel, 2D

Reetz, Edgar, 3J

Regio, P., 4O

Reithmeier, Eduard, 0R, 13

Ren, Huan, 2V

Řeřucha, Šimon, 4K, 4N

Ribeiro, Álvaro S., 2D

Rinner, Stefan, 26

Rodrigues, Joel J. P. C., 3Q, 4J

Romero, J., 2C

Royo, Santiago, 1Y

Rudek, Florian, 0F

Salimi Meidanshahi, Fatemeh, 45

Salzenstein, Fabien, 0Z

Samper, Serge, 23

Samsonov, A. M., 3V

Sanz-Sabater, Martin, 3X

Sarma, Sanjay E., 4A

Schardt, Michael, 1R

Schellhorn, Mathias, 3K

Schott, Robert, 14

Schrey, Olaf, 1V

Schröder, Werner, 4G

Schulz, M., 1F

Sedlár, Petr, 4M

Seewig, Jörg, 10

Seidel, Frank, 12

Semenova, I. V., 3V

Seo, Y. B., 07

Serikova, Mariya G., 3Q, 4C, 4J

Serio, Bruno, 3C, 3G, 3Y

Serres, Nicolas, 0Z

Shao, Jianda, 34, 36

Shi, Zhendong, 2V

Shinoda, Yukitaka, 2X

Shokri, Babak, 45

Singh, Gurdeep, 2B

Skakov, Pavel A., 33

Smekhov, Andrey, 40

Smirnov, Nikolai V., 35

Sorg, P., 1T

Sotnik, A. V., 32

Stavridis, M., 1F

Štroner, Martin, 2O

Su, Kai Leung, 2Y

Su, Yonggang, 2Y

Suckow, A., 1T

Sun, Chen, 2Y

Sun, Weimin, 37

Sunarjo, Jonathan, 1D

Tang, Chen, 2Y

Taphanel, Miro, 0Y

Tatam, Ralph P., 1N, 20

Taudt, Christopher, 0F, 0P, 3Z

Tereschenko, Stanislav, 0Q, 2F

Theska, René, 35

Tian, He, 37

Timofeev, Alexander N., 2W, 3M, 3N, 4B, 4C

Timofeev, Andrey V., 3Q, 4J

Tremmel, Anton, 1R

Trifonov, Kirill V., 3A

Trivedi, Vismay, 3H, 3W

Tsyganok, E. A., 46

Turgalieva, Tatyana V., 43

Tusch, Jan, 14

Twin, Andrew, 20

Urban, Rudolf, 2O

Vallan, A., 4O

Valyukhov, Vladimir P., 2N

Vasilev, Aleksandr S., 2W

Veselova, Valeriya E., 25

Villatoro, Joel, 1Z

Viotti, Matias R., 0T, 0V

Vladimirov, Alexandr P., 25

Voelkel, Reinhard, 1D

Volynsky, Maxim A., 33

von Freymann, Georg, 10

Voznesenskaia, Mariia, 1K

Voznesenskaia, Tatiana, 1K

Voznesenskiy, Nikolay B., 1K

Vychodil, Miloslav, 4M

Wang, Hongliang, 3D

Wang, Jing, 37

Wang, Ke, 2Z

Wang, Qi, 2A

Wang, Wei, 2Z, 3D

Wang, Yang, 0B

Weber, Andreas, 4G

Wei, Guo, 2A

Wiedenmann, Ernst, 14

Wolf, Andreas, 14

Wu, Guanhao, 02

Wu, Hongyan, 0H

Xie, Huimin, 1P

Xu, Haiyan, 0H

Xu, Y. J., 21

Yamaguchi, Tatsuya, 2X

Yan, K., 21

Yan, Yunxiang, 37

Yanagawa, Takumi, 0K

Yang, C., 21

Yang, Haiyue, 22

Yang, Yi, 2V

Yaryshev, Sergey N., 32, 3M

Yegorov, D. I., 46

Yi, Duo, 3G

Yi, Kui, 34, 36

Yokozeki, S., 0W

Yoshimura, Michihiko, 18

Yu, Jie, 1K

Yuan, Minglei, 2Z, 3D

Yuan, Quan, 2V

Zalevsky, Zeev, 3H, 3U

Zatočilová, Aneta, 16

Zhang, Chen, 0X

Zhang, Chunmin, 30

Zhang, Haitao, 1K

Zhang, Junjiang, 2Y

Zhang, Lin, 2V

Zhang, Wenlong, 1K

Zhang, Xuewu, 0H

Zhang, Zhuo, 0H

Zhao, Chang, 2Z

Zhao, Fulai, 3B

Zhao, Yuan’an, 34, 36

Zhou, Jian, 2A, 2K

Zhou, You, 36

Zink, Ralf, 0Y

Zubia, Joseba, 1Z

Zuo, Chao, 2E

Zvereva, Elena N., 3I

Conference Committee

Symposium Chairs

  • Wolfgang Osten, Universität Stuttgart (Germany)

  • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • Andrew John Moore, Heriot-Watt University (United Kingdom)

Conference Chair

  • Peter Lehmann, Universität Kassel (Germany)

Conference Co-Chairs

  • Wolfgang Osten, Universität Stuttgart (Germany)

  • Armando Albertazzi G. Jr., Universidade Federal de Santa Catarina (Brazil)

Conference Program Committee

  • Oleg V. Angelsky, Yuriy Fedkovych Chernivtsi National University (Ukraine)

  • Anand Krishna Asundi, Nanyang Technological University (Singapore)

  • Ralf B. Bergmann, Bremer Institut für angewandte Strahltechnik GmbH (Germany)

  • Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)

  • Chau-Jern Cheng, National Taiwan Normal University (Taiwan)

  • Yuri V. Chugui, Technological Design Institute of Scientific Instrument Engineering (Russian Federation)

  • Wim M. J. Coene, ASML Netherlands B.V. (Netherlands)

  • Jürgen W. Czarske, Technische Universität Dresden (Germany)

  • Peter J. de Groot, Zygo Corporation (United States)

  • Pietro Ferraro, Istituto Nazionale di Ottica (Italy)

  • Cosme Furlong, Worcester Polytechnic Institute (United States)

  • Marc P. Georges, Universiteit de Liège (Belgium)

  • Christophe Gorecki, FEMTO-ST (France)

  • Yoshio Hayasaki, Utsunomiya University (Japan)

  • Myung K. Kim, University of South Florida (United States)

  • Tomasz Kozacki, Warsaw University of Technology (Poland)

  • Richard Kowarschik, Friedrich-Schiller-Universität Jena (Germany)

  • Eberhard Manske, Technische Universität Ilmenau (Germany)

  • Kaoru Minoshima, The University of Electro-Communications (Japan)

  • Andrew John Moore, Heriot-Watt University (United Kingdom)

  • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • Yukitoshi Otani, Utsunomiya University (Japan)

  • YongKeun Park, KAIST (Korea, Republic of)

  • Pascal Picart, Université du Maine (France)

  • Eduard Reithmeier, Leibniz Universität Hannover (Germany)

  • Christian Rembe, Polytec GmbH (Germany)

  • Robert Schmitt, RWTH Aachen Universität (Germany)

  • Jörg Seewig, Universität Kaiserlautern, Germany

  • Pierre Slangen, Ecole des Mines d’Ales (France)

  • Cristina Trillo, Universitat de Vigo (Spain)

  • Rainer Tutsch, Technische Universität Braunschweig (Germany)

  • Eriko Watanabe, The University of Electro-Communications (Japan)

Session Chairs

  • 1 Resolution-enhanced Techniques

    • Peter Lehmann, Universität Kassel (Germany)

    • Wolfgang Osten, Institut für Technische Optik (Germany)

  • 2 Interferometric Techniques

    • Pasquale Memmolo, Istituto Italiano di Tecnologia (Italy)

  • 3 OCT and Fiber Sensors

    • Peter Lehmann, Universität Kassel (Germany)

  • 4 Digital Holography

    • Pascal Picart, Université du Maine (France)

  • 5 White-Light Interferometry

    • Peng Gao, Xi’an Institute of Optics and Precision Mechanics (China)

  • 6 Speckle and Shearing Interferometry

    • Jörg Seewig, Universität Kaiserslautern (Germany)

  • 7 Confocal and WLI Techniques

    • Peter J. de Groot, Zygo Corporation (United States)

  • 8 Fringe Projection and 3D Imaging

    • Matias R. Viotti, Universidade Federal de Santa Catarina (Brazil)

  • 9 Deflectometry

    • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

  • 10 Joint Session I: Measurement of Optical Components and Systems

    • Jean-Michel Asfour, Dioptic GmbH (Germany)

    • Christof Pruss, Institut für Technische Optik (Germany)

  • 11 Joint Session II: Measurement of Optical Components and Systems

    • Jean-Michel Asfour, Dioptic GmbH (Germany)

    • Christof Pruss, Institut für Technische Optik (Germany)

  • 12 3D Shape, Displacement, and Deformation Measurement

    • Jürgen W. Czarske, Technische Universität Dresden (Germany)

  • 13 Nondestructive Testing and In-process Measurement

    • Marc P. Georges, Universiteit de Liège (Belgium)

  • 14 Vibration Measurement

    • Joris Dirckx, Universiteit Antwerpen (Belgium)

  • 15 Defect Detection

    • Armando Albertazzi G. Jr., Universidade Federal de Santa Catarina (Brazil)

Introduction

Optical metrology systems for industrial inspection are well-established for tens of years in nearly all relevant fields of industrial production. In times where the physical limits of most measurement principles are well-understood, it often seems to be a question of ingenious utilization of well-known physical concepts in combination with innovative components that push new developments and enhance the capabilities of optical metrology. Nevertheless, there remains considerable room for extension of application ranges, improvement of accuracy and reliability, and integration of optical inspection systems in industrial processes.

In 2015, two further aspects that direct public attention to optical technologies and metrology are noteworthy. The first is the international year of light proclaimed by the UNESCO and supported by many international and national organizations and institutions. The IYL supports optical technologies since it emphasizes their importance with respect to education, research and economy. The second aspect is driven by the industry 4.0 (Smart Factory) agenda and it is related to the future of manufacturing. Smart manufacturing systems and intelligent industrial networks require intensive application of measurement systems especially in industrial environments. Even today, optical systems show great potential in this context, since they are characterized by in-process capabilities, high speed, high accuracy, and reasonable costs.

As a consequence, the Munich conference is still an important international forum of scientific exchange and discussion in the field of optical metrology. More than 160 submissions demonstrate that even after nearly 14 years, the Munich conference series is a considerable event for researchers working in the field of optical metrology all over the world.

With more than 75 oral presentations and 80 posters, the 2015 conference could hold the high number and outstanding level of contributions. This builds the basis of its success. As in previous years, a significant number of contributions deal with optical measurement of three-dimensional geometrical features. A traditional field of application the conference always focuses on, is the measurement of optical components, e.g. aspheres, free-form surfaces, and optical systems. Therefore, we are happy to announce once again a joint session that will be held together with the EOS Conference on Manufacturing and Testing of Optical Components (EOSMTOC) on Wednesday afternoon.

As there are always individuals pushing things forward, we would like to thank those who supported this conference with their dedication. First, we would like to express our sincere gratitude to the members of the program committee for their support in the run-up of the conference. We also thank all authors, especially the distinguished plenary and invited speakers: Ramesh Raskar (MIT Media Laboratory, United States) for his paper “Extreme Computational Imaging: Photography, Health-tech and Displays,” as well as Kaoru Minoshima (University of Electro-Communications, Japan), Peng Gao (State Key Laboratory of Transient Optics and Photonics, Chinese Academy of Sciences, China), Matias Viotti (Universidade Federal de Santa Catarina, Brazil), Joris Dirckx (University of Antwerp, Belgium), Marc Georges (Centre Spatial de Liège - Université de Liège, Belgium), and the invited speakers of the joint session, Greg Forbes (QED Technologies Inc., University of North Carolina at Charlotte, United States) and Michael Schulz (Physikalisch-Technische Bundesanstalt, Germany) for their stimulating lectures. Additionally, many thanks are due to the SPIE staff for their professional and cooperative work during the conference organization and the preparation of this proceedings volume. Finally, thanks are also due to all authors, who not only fill the conference with life but also give added value by contributing to these proceedings.

© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9525", Proc. SPIE 9525, Optical Measurement Systems for Industrial Inspection IX, 952501 (22 June 2015); doi: 10.1117/12.2197953; https://doi.org/10.1117/12.2197953
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