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21 June 2015 Methods for optical modeling and cross-checking in ellipsometry and scatterometry
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Indirect optical methods like ellipsometry or scatterometry require an optical model to calculate the response of the system, and to fit the parameters in order to minimize the difference between the calculated and measured values. The most common problem of optical modeling is that the measured structures and materials turn out to be more complex in reality than the simplified optical models used as first attempts to fit the measurement. The complexity of the optical models can be increased by introducing additional parameters, if they (1) are physically relevant, (2) improve the fit quality, (3) don't correlate with other parameters. The sensitivity of the parameters can be determined by mathematical analysis, but the accuracy has to be validated by reference methods. In this work some modeling and verification aspects of ellipsometry and optical scatterometry will be discussed and shown for a range of materials (semiconductors, dielectrics, composite materials), structures (damage and porosity profiles, gratings and other photonic structures, surface roughness) and cross-checking methods (atomic force microscopy, electron microscopy, x-ray diffraction, ion beam analysis). The high-sensitivity, high-throughput, in situ or in line capabilities of the optical methods will be demonstrated by different applications.
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P. Petrik, B. Fodor, E. Agocs, P. Kozma, J. Nador, N. Kumar, J. Endres, G. Juhasz, C. Major, S. F. Pereira, T. Lohner, H. P. Urbach, B. Bodermann, and M. Fried "Methods for optical modeling and cross-checking in ellipsometry and scatterometry", Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 95260S (21 June 2015);

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