21 June 2015 Correction of depolarization effect in Mueller matrix ellipsometry with polar decomposition method
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Mueller matrix ellipsometry has been demonstrated as a powerful tool for nanostructure metrology in high-volume manufacturing. Many factors may induce depolarization effect in the Mueller matrix measurement, and consequently, may lead to accuracy loss in the nanostructure metrology. In this paper, we propose to apply a Mueller matrix decomposition method for the Mueller matrix measurement to separate the depolarization effect caused by the MME system. The method is based on the polar decomposition by decomposing the measured depolarizing Mueller matrix into a sequence of three matrices corresponding to a diattenuator followed by a retarder and a depolarizer. Since the depolarization effects will be only reflected in the depolarizer matrix, the other two matrices are used to extract the structure parameters of the measured sample. Experiments performed on a one-dimensional silicon grating structure with an in-house developed MME layout have demonstrated that the proposed method achieves a higher accuracy in the nanostructure metrology.
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Weiqi Li, Weiqi Li, Chuanwei Zhang, Chuanwei Zhang, Hao Jiang, Hao Jiang, Xiuguo Chen, Xiuguo Chen, Honggang Gu, Honggang Gu, Shiyuan Liu, Shiyuan Liu, } "Correction of depolarization effect in Mueller matrix ellipsometry with polar decomposition method", Proc. SPIE 9526, Modeling Aspects in Optical Metrology V, 952619 (21 June 2015); doi: 10.1117/12.2184786; https://doi.org/10.1117/12.2184786

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