14 July 2015 Effects of annealing on properties of Al2O3 monolayer film at 355 nm
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Abstract
Al2O3 monolayer films were deposited on fused silica substrate and K9 glass substrate by electron-beam deposition. Annealing as a general post-treatment was used to enhance the quality of the Al2O3 coatings. The optical properties of the films were analyzed from the transmission spectra of the samples. The composition of the samples before and after annealing were measured by X-ray photoelectron spectroscopy (XPS). According to the analysis of the results, it can be found that the oxidation degree of the coatings increases after annealing in O2 inside coating chamber. The laser-induced damage thresholds of the Al2O3 films can be increased after the annealing process. Finally, the damage morphologies of the Al2O3 coatings were analyzed.
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Feifei Tu, Hu Wang, Huanbin Xing, Ruxi Zheng, Weili Zhang, Kui Yi, "Effects of annealing on properties of Al2O3 monolayer film at 355 nm", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95321F (14 July 2015); doi: 10.1117/12.2185988; https://doi.org/10.1117/12.2185988
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