22 July 2015 Influence of thickness and annealing temperature on the structure properties of random mask deposited by magnetron sputtering
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Abstract
The structure properties of random mask of antireflective structure prepared by the thermal dewetting process are investigated. As a low-cost and large-scale technique, the mask obtained in our work has a great prospect in the field of solar cell and high power laser system. Ultrathin films of amorphous Ag are deposited on the fused silica by magnetron sputtering. By fast thermal annealing the structures in Ag film are agglomerated on the substrate and form mask. The influence of different thickness and annealing temperature on the structure properties of random mask are studied. The surface morphologies are characterized by scanning electronic microscopy. The suitable conditions to obtain excellent quality Ag nanomasks with the pebble particles are achieved.
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Jiaoling Zhao, Jiaoling Zhao, Hu Wang, Hu Wang, Hongji Qi, Hongji Qi, Weili Zhang, Weili Zhang, Yingjie Chai, Yingjie Chai, Jialu Guo, Jialu Guo, Hongbo He, Hongbo He, } "Influence of thickness and annealing temperature on the structure properties of random mask deposited by magnetron sputtering", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 953224 (22 July 2015); doi: 10.1117/12.2186014; https://doi.org/10.1117/12.2186014
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