Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique

Stephen J. Bauman; Desalegn T. Debu; Joseph B. Herzog

doi:10.1117/12.2188335

20 August 2015 Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique

Stephen J. Bauman, Desalegn T. Debu, Joseph B. Herzog

Proceedings Volume 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII; 95560M (2015) https://doi.org/10.1117/12.2188335
Event: SPIE Nanoscience + Engineering, 2015, San Diego, California, United States

Abstract

Making use of a newly established nanomasking technique, nanoscale features (sub-10 nm) have been fabricated with the potential to act as plasmonic enhancement structures. The technique makes use of a two-step lithography process to simultaneously produce many plasmonic hotspots with two-dimensional features over a large area, showing promise for mass production scalability. This technique is highly reproducible, reliably patterning multiple nanostructures and nanogaps over a potentially wafer-scale area without significantly increasing the number of steps required. Fabrication results show promise for scalability towards applications such as biosensing, photovoltaics, and enhanced spectroscopies.

Conference Presentation

Citation Download Citation

Stephen J. Bauman, Desalegn T. Debu, and Joseph B. Herzog "Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560M (20 August 2015); https://doi.org/10.1117/12.2188335

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