20 August 2015 Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique
Author Affiliations +
Making use of a newly established nanomasking technique, nanoscale features (sub-10 nm) have been fabricated with the potential to act as plasmonic enhancement structures. The technique makes use of a two-step lithography process to simultaneously produce many plasmonic hotspots with two-dimensional features over a large area, showing promise for mass production scalability. This technique is highly reproducible, reliably patterning multiple nanostructures and nanogaps over a potentially wafer-scale area without significantly increasing the number of steps required. Fabrication results show promise for scalability towards applications such as biosensing, photovoltaics, and enhanced spectroscopies.
Conference Presentation
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen J. Bauman, Desalegn T. Debu, Joseph B. Herzog, "Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560M (20 August 2015); doi: 10.1117/12.2188335; https://doi.org/10.1117/12.2188335

Back to Top