Translator Disclaimer
Paper
20 August 2015 Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement
Author Affiliations +
Abstract
We have developed a EUV scatterometer using a focused high-order harmonic generation (HHG) source for nano-scale grating measurement. The coherent light source with multiple discrete wavelengths of 25-35 nm was pumped by a tabletop Ti:sapphire laser system. A charge-couple-device (CCD) camera directly records the diffraction image of the zero and the first order diffraction information from the grating samples. The grating structure can be reconstructed base on the calculations from the location and the intensity distribution of diffraction pattern.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chia-Liang Yeh, Yi-Sha Ku, Yi-Chen Hsieh, and Chia-Hung Cho "Development of EUV scatterometer with high-harmonic-generation EUV source for nano-scale grating measurement ", Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95561F (20 August 2015); https://doi.org/10.1117/12.2194234
PROCEEDINGS
8 PAGES


SHARE
Advertisement
Advertisement
Back to Top