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20 August 2015 Realization of highly transparent conducting CdO thin films by R.F. Magnetron sputtering for optoelectronic applications
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Abstract
Cadmium Oxide (CdO) thin films with low electrical resistivity and higher transparency has been deposited by r.f. magnetron sputtering on glass substrates. Sputtering process was carried out at r.f. power of 40W and with varying substrate temperatures. The structural, morphological, electrical and optical properties of the deposited films are investigated. The structral properties reveals that the as-deposited CdO films shows preferential orientation along (111) plane exhibiting face centered cubic structure. The surface morphology shows that all the films possess well defined grain boundaries with high uniformity. CdO samples deposited at substrate temperature of 150°C with r.f. power of 40W exhibits above 95% transparency in the visible region with lower electrical resistivity value in the order of 10-4 Ω.cm. The comparatevely high value of the figure of merit for the optimum sample of CdO deposited at 150°C indicates that these films are suitable for optoelectronic device applications.
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Saheer Cheemadan, R. Amiruddin, and M.C. Santhosh Kumar "Realization of highly transparent conducting CdO thin films by R.F. Magnetron sputtering for optoelectronic applications", Proc. SPIE 9558, Nanostructured Thin Films VIII, 955816 (20 August 2015); https://doi.org/10.1117/12.2190424
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