22 September 2015 Low electron temperature in ablating materials formed by picosecond soft x-ray laser pulses
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Abstract
To study the ablation process induced by the soft x-ray laser pulse, we investigated the electron temperature of the ablating material. Focused soft x-ray laser pulses having a wavelength of 13.9 nm and duration of 7 ps were irradiated onto the LiF, Al, and Cu surfaces, and we observed the optical emission from the surfaces by use of an optical camera. On sample surfaces, we could confirm damage structures, but no emission signal in the visible spectral range during ablation could be observed. Then, we estimated the electron temperature in the ablating matter. To consider the radiation from a heated layer, we supposed a black-body radiator as an object. The calculation result was that the electron temperature was estimated to be lower than 1 eV and the process duration was shorter than 1000 ps. The theoretical model calculation suggests the spallative ablation for the interaction between the soft x-ray laser and materials. The driving force for the spallation is an increasing pressure appearing in the heated layer, and the change of the surface is considered to be due to a splash of a molten layer. The model calculation predicts that the soft x-ray laser with the fluence around the ablation threshold can create an electron temperature around 1 eV in a material. The experimental result is in good accordance with the theoretical prediction. Our investigation implies that the spallative ablation occurs in the low electron temperature region of a non-equilibrium state of warm dense matter.
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Masahiko Ishino, Masahiko Ishino, Noboru Hasegawa, Noboru Hasegawa, Masaharu Nishikino, Masaharu Nishikino, Tatiana Pikuz, Tatiana Pikuz, Igor Skobelev, Igor Skobelev, Anatoly Faenov, Anatoly Faenov, Nail Inogamov, Nail Inogamov, Tetsuya Kawachi, Tetsuya Kawachi, Mitsuru Yamagiwa, Mitsuru Yamagiwa, } "Low electron temperature in ablating materials formed by picosecond soft x-ray laser pulses", Proc. SPIE 9589, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI, 958904 (22 September 2015); doi: 10.1117/12.2186053; https://doi.org/10.1117/12.2186053
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