Results are presented which provide information about the correlation between deposition parameters (Assistance, choice of working gas) and the optical properties of the films. Correlations between optical and non-optical (stress, EDXresults) properties are further presented and discussed in terms of classical models. Reproducibility issues are discussed, too.
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O. Stenzel, S. Wilbrandt, N. Kaiser, "Optical characterization of high index metal oxide films for UV/VIS applications, prepared by Plasma Ion Assisted Deposition," Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962709 (23 September 2015);