High efficiency RF-plasma source with increased energy range

D. Arhilger; H. Hagedorn; H. Reus; A. Zöller

doi:10.1117/12.2191344

23 September 2015 High efficiency RF-plasma source with increased energy range

D. Arhilger, H. Hagedorn, H. Reus, A. Zöller

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96270O (2015) https://doi.org/10.1117/12.2191344
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

A new, highly efficient impedance matching network is introduced , increasing the LION300 RF-source efficiency by approximately 20% and enabling considerably higher SiO₂ rates for the production of shift-free and low scattering interference filters. Results of single layer coatings and a UV-IR cut filter are presented.

Citation Download Citation

D. Arhilger, H. Hagedorn, H. Reus, and A. Zöller "High efficiency RF-plasma source with increased energy range", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270O (23 September 2015); https://doi.org/10.1117/12.2191344

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available