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23 September 2015 High efficiency RF-plasma source with increased energy range
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Abstract
A new, highly efficient impedance matching network is introduced , increasing the LION300 RF-source efficiency by approximately 20% and enabling considerably higher SiO2 rates for the production of shift-free and low scattering interference filters. Results of single layer coatings and a UV-IR cut filter are presented.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Arhilger, H. Hagedorn, H. Reus, and A. Zöller "High efficiency RF-plasma source with increased energy range", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270O (23 September 2015); https://doi.org/10.1117/12.2191344
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