Atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material

Kristin Pfeiffer; Svetlana Shestaeva; Astrid Bingel; Peter Munzert; Ulrike Schulz; Norbert Kaiser; Andreas Tünnermann; Adriana Szeghalmi

doi:10.1117/12.2191283

23 September 2015 Plasma-enhanced atomic layer deposition for antireflection coatings using SiO₂ as low-refractive index material

Kristin Pfeiffer, Svetlana Shestaeva, Astrid Bingel, Peter Munzert, Ulrike Schulz, Norbert Kaiser, Andreas Tünnermann, Adriana Szeghalmi

Author Affiliations +

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96270Q (2015) https://doi.org/10.1117/12.2191283
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

This study focuses on the atomic layer deposition (ALD) of high quality SiO₂ thin films for optical application. One of the challenges for the application of dielectric ALD layers in optical coatings is the realization of low absorption and scattering losses. Furthermore the layers have to be prepared with a precise controlled thickness and repeatable optical properties. SiO₂ films were deposited using tris[dimethylamino]silane (3DMAS) and oxygen plasma on Si(100)substrates, quartz and BK7 glass substrates at temperatures between 100 °C and 300 °C. Film growth rate and refractive indices of SiO₂ thin films were studied as function of deposition temperature. A linear growth behavior of SiO₂ ALD films is confirmed, allowing a scalability of film thickness just by counting ALD cycles. The grown films are resistant to abrasion and possess good adhesion to glass substrates. The optical losses of the films are negligible in the investigated spectral range from 250 nm to 1100 nm. An antireflective (AR) coating was prepared by atomic layer deposition using SiO₂ as low refractive index material and HfO₂ as high refractive index material.

Citation Download Citation

Kristin Pfeiffer, Kristin Pfeiffer, Svetlana Shestaeva, Svetlana Shestaeva, Astrid Bingel, Astrid Bingel, Peter Munzert, Peter Munzert, Ulrike Schulz, Ulrike Schulz, Norbert Kaiser, Norbert Kaiser, Andreas Tünnermann, Andreas Tünnermann, Adriana Szeghalmi, Adriana Szeghalmi, } "Plasma-enhanced atomic layer deposition for antireflection coatings using SiO₂ as low-refractive index material", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96270Q (23 September 2015); doi: 10.1117/12.2191283; https://doi.org/10.1117/12.2191283

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years