Low scattering filter coatings made by plasma-assisted reactive magnetron sputtering

Jan Broßmann; Marc Lappschies; Stefan Jakobs; Volker Kirschner

doi:10.1117/12.2191046

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23 September 2015 Low scattering filter coatings made by plasma-assisted reactive magnetron sputtering

Jan Broßmann, Marc Lappschies, Stefan Jakobs, Volker Kirschner

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Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 962710 (2015) https://doi.org/10.1117/12.2191046
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

Scattering in thin-film filters is mainly driven by the substrate roughness and the deposition technology but also by the coating design as well as by the filter orientation. A high-energy, low-loss coating technology (plasma-assisted reactive magnetron sputtering, PARMS) was used to deposit an advanced thin-film filter design on substrates with low micro roughness. This approach resulted in a significantly reduced level of scattered light as well as an excellent spectral performance of the produced filters. Compared to coatings deposited by ion-assisted evaporation (IAD), the level of out-of-band scattering could be reduced by more than 2 orders of magnitude to about 0.001%.

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Jan Broßmann, Marc Lappschies, Stefan Jakobs, and Volker Kirschner "Low scattering filter coatings made by plasma-assisted reactive magnetron sputtering", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962710 (23 September 2015); https://doi.org/10.1117/12.2191046

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