We investigated excimer laser ablation as a mastering technology for micro textured surfaces, where we targeted an increase in correspondence between surface design and ablated surface for high aspect ratio structures. To achieve this we have improved the photo mask design using a heuristic algorithm that corrects for the angular dependence of the ablation process and the loss of image resolution at ablation depths that exceed the depth of field. Using this approach we have been able to demonstrate close correspondence between designed and ablated facet structures up to 75° inclination at 75 μm depth.
These facet design parameters allow for total internal reflection (TIR) as a means of beam deflection which is demonstrated in a range of mono shaped cone arrays in hexagonal tessellation. BSDF analysis was used to characterize the narrow TIR deflection beams that matched the peak positions of the design down to 28° apex. In addition, a single surface TIR-Fresnel lens design with focal distance 5 mm has been manufactured using this photo mask design algorithm and beam collimation up to 12° beam angle and 32° field angle is shown.
These outcomes demonstrate that the laser ablation process intrinsically yields sufficient small dispersion in structure and fillet radii for lighting applications.