In-line metrology setup for periodic nanostructures based on sub-wavelength diffraction

Martin Kreuzer; Jordi Gomis Bresco; Marianna Sledzinska; Clivia M. Sotomayor Torres

doi:10.1117/12.2191346

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24 September 2015 In-line metrology setup for periodic nanostructures based on sub-wavelength diffraction

Martin Kreuzer, Jordi Gomis Bresco, Marianna Sledzinska, Clivia M. Sotomayor Torres

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Proceedings Volume 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V; 96281Q (2015) https://doi.org/10.1117/12.2191346
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

The analysis of diffracted light from periodic structures is shown to be a versatile metrology technique applicable to inline metrology for periodic nanostructures. We show that 10 nm changes in periodic structures can be traced optically by means of sub-wavelength diffraction. Polymer gratings were fabricated by electron beam lithography. The gratings have a common periodicity of 6 μm, but different line width, ranging from 370 to 550 nm in 10 nm steps. A comparison between the resulting diffraction patterns shows marked differences in intensity which are used to sense nanometre scale deviations in periodic structures.

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Martin Kreuzer, Jordi Gomis Bresco, Marianna Sledzinska, and Clivia M. Sotomayor Torres "In-line metrology setup for periodic nanostructures based on sub-wavelength diffraction", Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96281Q (24 September 2015); https://doi.org/10.1117/12.2191346

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