23 November 2015 Multipulse degradation of fused silica surfaces at 351 nm
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Abstract
We investigate the multipulse degradation of fused silica surfaces exposed at 351 nm for up to 109 pulses at pulse fluences greater than 10 J/cm2. In vacuum, the transmission loss increases as a function of the number of shots at low pulse intensity. However, as the pulse intensity increases, the transmission loss decreases and is not measureable above a certain intensity. Transmission loss is highest when measured at shorter wavelengths, and decreases towards the IR. Absorption is the primary mechanism that leads to transmission loss and is from photo-reduction of the silica surface.
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Sonny Ly, Sonny Ly, Ted A. Laurence, Ted A. Laurence, Nan Shen, Nan Shen, Bill Hollingsworth, Bill Hollingsworth, Mary Norton, Mary Norton, Jeff D. Bude, Jeff D. Bude, } "Multipulse degradation of fused silica surfaces at 351 nm", Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 96320T (23 November 2015); doi: 10.1117/12.2195595; https://doi.org/10.1117/12.2195595
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