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11 October 2015 Fabrication of EUVL micro-field exposure tools with 0.5 NA
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Proceedings Volume 9633, Optifab 2015; 96330V (2015) https://doi.org/10.1117/12.2203138
Event: SPIE Optifab, 2015, Rochester, New York, United States
Abstract
In support of the Extreme Ultraviolet Lithography (EUV, EUVL) roadmap, a joint program between Zygo Corporation and SEMATECH is under way to develop 13.5 nm, 0.5NA R&D photolithography tools with small fields. Those tools are referenced as micro-field exposure tools, or METs. Previous papers1,2,3 have focused on the design and theoretical performance and the fabrication and testing of the optical components.

In this paper, results from the completed projection optic box (PO, POB) systems are presented. The achieved single pass transmitted wavefront (CA – 30 cycles/aperture) on the first two systems was better than 0.25nm RMS at the center of the field and < 0.48nm RMS over the 30um x 200um field, less than half of the original specification. The flare, as calculated from the component roughness data, is less than the 5% specification.

The paper includes a presentation of results from the component mirror metrology, the multilayer coatings, and the system metrology. To support the tight specifications, the component and system metrology tests required test reproducibility on the order of <50pm. To achieve the high quality wavefront, the optic mounts had to produce very small surface deformation. Also, the precision and stability of the alignment had to be controlled to a few tens of nanometer. The mirror motion is controlled by a hexapod system and the processes and mechanics that were used to align the POB will be described. Results of alignment convergence, wavefront error at the center of the field and over the field, as well as reproducibility are presented.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luc Girard, Lou Marchetti, Mark Bremer, Jim Kennon, Bob Kestner, and Sam Hardy "Fabrication of EUVL micro-field exposure tools with 0.5 NA", Proc. SPIE 9633, Optifab 2015, 96330V (11 October 2015); https://doi.org/10.1117/12.2203138
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