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23 October 2015 Detection capability enhancement with a learning system for PEM mask inspection tool
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Abstract
A learning system has been exploited for the mask inspection tool with the Projection Electron Microscope (PEM). The defect is identified by the PEM system using the "defectivity". The detection capability for hp11nm EUV masks is demonstrated. The learning system for PEM consists of the library of the registered defects. The learning system totally optimizes detection capability reconciling the previously registered defects and the newly registered defect. We have verified the effectiveness of the learning system. We can provide a user-friendly mask inspection system with the higher throughput by PEM and with the smaller cost of ownership by the development.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryoichi Hirano, Masahiro Hatakeyama, Kenji Terao, and Hidehiro Watanabe "Detection capability enhancement with a learning system for PEM mask inspection tool", Proc. SPIE 9635, Photomask Technology 2015, 96350B (23 October 2015); https://doi.org/10.1117/12.2196944
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