3 November 2015 Examination of phase retrieval algorithms for patterned EUV mask metrology
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Abstract
We evaluate the performance of several phase retrieval algorithms using through-focus aerial image measurements of patterned EUV photomasks. Patterns present a challenge for phase retrieval algorithms due to the high- contrast and strong diffraction they produce. For this study, we look at the ability to correctly recover phase for line-space patterns on an EUV mask with a TaN absorber and for an etched EUV multilayer phase shift mask. The recovered phase and amplitude extracted from measurements taken using the SHARP EUV microscope at Lawrence Berkeley National Laboratory is compared to rigorous, 3D electromagnetic simulations. The impact of uncertainty in background intensity, coherence, and focus on the recovered field is evaluated to see if the algorithms respond differently.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rene A. Claus, Rene A. Claus, Yow-Gwo Wang, Yow-Gwo Wang, Antoine Wojdyla, Antoine Wojdyla, Markus P. Benk, Markus P. Benk, Kenneth A. Goldberg, Kenneth A. Goldberg, Andrew R. Neureuther, Andrew R. Neureuther, Patrick P. Naulleau, Patrick P. Naulleau, } "Examination of phase retrieval algorithms for patterned EUV mask metrology", Proc. SPIE 9635, Photomask Technology 2015, 96350F (3 November 2015); doi: 10.1117/12.2197868; https://doi.org/10.1117/12.2197868
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