Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography

Shao-Wen Chang; Tzu-Yi Wang; Ta-Cheng Lien; Chia-Jen Chen; Chih-Cheng Lin; Sin-Chang Lee; Anthony Yen

doi:10.1117/12.2197838

28 October 2015 Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography

Shao-Wen Chang, Tzu-Yi Wang, Ta-Cheng Lien, Chia-Jen Chen, Chih-Cheng Lin, Sin-Chang Lee, Anthony Yen

Proceedings Volume 9635, Photomask Technology 2015; 96350I (2015) https://doi.org/10.1117/12.2197838
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

In this paper, a quantitative method to analyze the effective range of fogging effect from massive data is presented. According to the calculated effective range, we use two approaches to correct the pattern-dependent CD error that come from e-beam writing. One is the fogging effect correction(FEC), which uses a Gaussian distributed model to describe FE. Second, we implement dosage modulation based on the assumption that the error caused by FE is linearly proportional to the pattern density of a mask. In summary, we are able to successfully predict the map of CD error for various layouts, and correct the error caused by FE in mask-making.

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Shao-Wen Chang, Tzu-Yi Wang, Ta-Cheng Lien, Chia-Jen Chen, Chih-Cheng Lin, Sin-Chang Lee, and Anthony Yen "Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography", Proc. SPIE 9635, Photomask Technology 2015, 96350I (28 October 2015); https://doi.org/10.1117/12.2197838

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