Based on the unresolved pattern inspection capability study using DUV mask inspection tool NPI-7000 for 14nm/10nm technology nodes, we developed a new optical imaging method and tested its inspection capability for the minute pattern smaller than the optical resolution. We confirmed the excellent defect detection capability and the expendability of DUV optics inspection using the new inspection method. Here, the inspection result of unresolved hp26/20nm pattern obtained by NPI-7000 with the new inspection method is descried.
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Hiromu Inoue, Nobutaka Kikuiri, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Takashi Hirano, Ryoji Yoshikawa, "DUV inspection tool application for beyond optical resolution limit pattern," Proc. SPIE 9635, Photomask Technology 2015, 96350R (23 October 2015);