High-durability phase-shift film with variable transmittance

Osamu Nozawa; Hiroaki Shishido; Takenori Kajiwara

doi:10.1117/12.2202596

28 October 2015 High-durability phase-shift film with variable transmittance

Osamu Nozawa, Hiroaki Shishido, Takenori Kajiwara

Proceedings Volume 9635, Photomask Technology 2015; 963517 (2015) https://doi.org/10.1117/12.2202596
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

In order to maintain the lithographic margin and to have sufficient image resolution, attenuated phase shift masks are widely used as a resolution enhancement technique. To improve the radiation durability of the phase shift film, we have developed low oxidation MoSi shifters, such as A6L2, as one option for improving radiation durability. But to provide the best radiation durability, we have developed a new approach eliminating the molybdenum from the phase shift film and introduced a Silicon-Nitride (Si-N) based attenuated phase shift film. Traditionally the transmittance of the phase shift layer is usually around 6%. In the case of a pure Si3N4 film, the transmittance with 180 degree phase shift is around 18%. But, by controlling film structure with a combination of Si-N the transmittance can be tuned to the customers desired transmission value for high durability Mo free attenuated phase shift films.

Citation Download Citation

Osamu Nozawa, Hiroaki Shishido, and Takenori Kajiwara "High-durability phase-shift film with variable transmittance", Proc. SPIE 9635, Photomask Technology 2015, 963517 (28 October 2015); https://doi.org/10.1117/12.2202596

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