9 November 2015 Actinic review of EUV masks: status and recent results of the AIMSTM EUV system
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Abstract
Key enabler of the successful introduction of EUV lithography into volume production is the EUV mask infrastructure. For the production of defect free masks, actinic review of potential defect sites to decide on the need for repair or compensation is required. Also, the repair or compensation with the ZEISS MERiT electron beam repair tool needs actinic verification in a closed loop mask repair solution. For the realization of actinic mask review, ZEISS and the SEMATECH EUVL Mask Infrastructure consortium started a development program for an EUV aerial image metrology system, the AIMSTM EUV, with realization of a prototype tool. The development and prototype realization of the AIMSTM EUV has entered the tool calibration and qualification phase utilizing the achieved capabilities of EUV aerial image acquisition and EUV mask handling. In this paper, we discuss the current status of the prototype qualification and show recent measurement results.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sascha Perlitz, Sascha Perlitz, Jan Hendrik Peters, Jan Hendrik Peters, Markus Weiss, Markus Weiss, Dirk Hellweg, Dirk Hellweg, Renzo Capelli, Renzo Capelli, Krister Magnusson, Krister Magnusson, Matt Malloy, Matt Malloy, Stefan Wurm, Stefan Wurm, } "Actinic review of EUV masks: status and recent results of the AIMSTM EUV system", Proc. SPIE 9635, Photomask Technology 2015, 96351D (9 November 2015); doi: 10.1117/12.2205054; https://doi.org/10.1117/12.2205054
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