Attenuated phase-shift mask (PSM) blanks for flat panel display

Kagehiro Kageyama; Satoru Mochizuki; Hiroyuki Yamakawa; Shigeru Uchida

doi:10.1117/12.2196857

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23 October 2015 Attenuated phase-shift mask (PSM) blanks for flat panel display

Kagehiro Kageyama, Satoru Mochizuki, Hiroyuki Yamakawa, Shigeru Uchida

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Proceedings Volume 9635, Photomask Technology 2015; 96351I (2015) https://doi.org/10.1117/12.2196857
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

The fine pattern exposure techniques are required for Flat Panel display applications as smart phone, tablet PC recently. The attenuated phase shift masks (PSM) are being used for ArF and KrF photomask lithography technique for high end pattern Semiconductor applications. We developed CrOx based large size PSM blanks that has good uniformity on optical characteristics for FPD applications. We report the basic optical characteristics and uniformity, stability data of large sized CrOx PSM blanks.

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Kagehiro Kageyama, Satoru Mochizuki, Hiroyuki Yamakawa, and Shigeru Uchida "Attenuated phase-shift mask (PSM) blanks for flat panel display", Proc. SPIE 9635, Photomask Technology 2015, 96351I (23 October 2015); https://doi.org/10.1117/12.2196857

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