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23 October 2015 Printability evaluation of programmed defects on OMOG masks
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Opaque Mosi on Glass (OMOG) photomask, significantly less prone to mask degradation, has been applied in leading-edge photolithographic flows on 20 nm and 14 nm node. Mask defect problem occurs at any time, rooted in various causes; therefore, defect printability disposition and verification need to be evaluated for new developing process. A series of programmed defects with typical sizes and shapes have been established for different mask patterns on OMOG masks and investigated for the defect printability influences through the CDSEM, AIMS and inspection tools. The results are compiled to produce the defect specifications that can be implemented on OMOG mask fabrication.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irene Shi, Eric Guo, Max Lu, Catherine Ren, Bojan Yan, Rivan Li, and Eric Tian "Printability evaluation of programmed defects on OMOG masks", Proc. SPIE 9635, Photomask Technology 2015, 96351M (23 October 2015);

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