9 July 2015 Grid-supported EUV pellicles: A theoretical investigation for added value
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EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the strength of the ultrathin membranes, grid-supported pellicle membranes have been proposed. In this study we compare grid-supported pellicles (GSP) over free-standing pellicles (FSP). We considered imaging, thermal, mechanical, and thermo-mechanical characteristics. Finite Element Methods (FEM) was used to investigate the thermal, and (thermo-)mechanical behavior of pellicles. The maximum temperature reached under operational conditions by the pellicle film was determined. Using a thermo-mechanical analysis wrinkling behavior was quantified. The mechanical analysis considered the influence of grid structures on the sagging behavior, on crack propagation, on the pellicle film resistance to collision with solid particles, and on the resistance to shocks on the pellicle frame. The analysis shows that GSP that meets imaging requirements will not bring any advantages over FSP.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Florian Dhalluin, Florian Dhalluin, Laurens de Winter, Laurens de Winter, Luigi Scaccabarozzi, Luigi Scaccabarozzi, Jack Van der Sanden, Jack Van der Sanden, Sven Lentzen, Sven Lentzen, Rob Van Gils, Rob Van Gils, Maurice Bogers, Maurice Bogers, Erik Ruinemans, Erik Ruinemans, Derk Brouns, Derk Brouns, Juan Diego Arias Espinoza, Juan Diego Arias Espinoza, Mária Péter, Mária Péter, Daniel Smith, Daniel Smith, Wim Van der Zande, Wim Van der Zande, Hans Vermeulen, Hans Vermeulen, } "Grid-supported EUV pellicles: A theoretical investigation for added value", Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580J (9 July 2015); doi: 10.1117/12.2197454; https://doi.org/10.1117/12.2197454


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