9 July 2015 Experimental observation of laser-produced Sn extreme ultraviolet source diameter for high-brightness source
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Abstract
The effect of sub-ns duration and sub-mJ energy laser pulse on 13.5 nm extreme ultraviolet (EUV) source diameter and conversion efficiency has been investigated. It was demonstrated that an in-band EUV source diameter as low as 18 μm has been produced due to short scale length of the picoseconds duration laser plasma. Such EUV source is suitable for high brightness and high repetition rate metrology applications.
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Goki Arai, Goki Arai, Hiroyuki Hara, Hiroyuki Hara, Thanh-Hung Dinh, Thanh-Hung Dinh, Atsushi Sunahara, Atsushi Sunahara, Takeshi Higashiguchi, Takeshi Higashiguchi, } "Experimental observation of laser-produced Sn extreme ultraviolet source diameter for high-brightness source", Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96581A (9 July 2015); doi: 10.1117/12.2192188; https://doi.org/10.1117/12.2192188
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