Evaluation of a dot target based high-brightness microplasma extreme ultraviolet (EUV) source by hydrodynamic simulation

Hiroyuki Hara; Goki Arai; Thanh-Hung Dinh; Atsushi Sunahara; Takeshi Higashiguchi

doi:10.1117/12.2192194

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9 July 2015 Evaluation of a dot target based high-brightness microplasma extreme ultraviolet (EUV) source by hydrodynamic simulation

Hiroyuki Hara, Goki Arai, Thanh-Hung Dinh, Atsushi Sunahara, Takeshi Higashiguchi

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Proceedings Volume 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII; 96581B (2015) https://doi.org/10.1117/12.2192194
Event: Photomask Japan 2015, 2015, Yokohama, Japan

Abstract

We evaluate the EUV emission and the spatial distributions of the plasma parameters by use of the two-dimensional (2-D) radiation hydrodynamic simulation in the microplasma high-brightness EUV source. The expected EUV source size, which is attributed to the expanding microplasma by the hydrodynamic motion, was evaluated to be 15 μm at the laser pulse duration of 150 ps [full width at half-maximum (FWHM)]. The numerical simulation suggests that the high brightness EUV source should be produced by use of a dot target based microplasma with the source diameter less than 20 μm. The emission at 13.5 nm was attributed to Sn charge states between Sn⁷⁺ and Sn¹²⁺ with the UTA spectral structure.

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Hiroyuki Hara, Goki Arai, Thanh-Hung Dinh, Atsushi Sunahara, and Takeshi Higashiguchi "Evaluation of a dot target based high-brightness microplasma extreme ultraviolet (EUV) source by hydrodynamic simulation", Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96581B (9 July 2015); https://doi.org/10.1117/12.2192194

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